95 Abstract With the rapid development of the IC manufacture, the critical dimension(CD) of the manufacturable CMOS technology has been put into 90nm, even 65nm and below from 130nm.
摘 要 随着IC制造技术的快速发展,可量产的CMOS技术,其特

也由0.13um
入了90nm
65nm
以下。
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When you're ready to capture a high-resolution image, the phosphorescent screen moves out of the way, and the image is captured using the second system with a more sensitive CMOS camera that has a higher resolution and dynamic range.
当您准备捕捉高分辨率图像时,磷光屏会移开,然后使
第二套
统, 该
统配备了一台分辨率和动态范围更高的CMOS相机来捕捉图像。