Then, a liquid called " photoresist" is spun on and baked to harden.

接着，一种名为“光刻胶”的液体被均匀涂抹并烘。

In the lit areas, a reaction weakens the photoresist's chemical bonds.

在光照区域，反应会削弱光刻胶的学键。

Next, using UV light and a stencil, a pattern is applied to the photoresist.

接下来，使用紫外线和模板，在光阻剂上施加图案。

The wafer is then sent through a hard bake to harden the remaining photoresist.

然后将硅片送入高温烘工，以剩余的光刻胶。

Where the mask blocks the light, the photoresist is unchanged.

在掩模阻挡光线的地方，光阻剂不会发生变。

Photoresists aren’t very useful by themselves, but are super powerful when used in conjunction with a photomask.

光阻剂自身并不是非常有用，但与光掩模结合使用时就变得非常强大。

Next, the wafer is sent to a photoresist stripper, where the mask layer is removed.

接下来，晶圆会被送到光阻剥离机，其中掩模层会被去除。

The wafer is doused in another chemical to wash away that weakened photoresist, leaving an image of the mask.

晶圆会被另一种学物质冲洗， 以清除那层被削弱的光阻剂，留下掩模的图像。

Note that the oxide layer under the photoresist is protected.

请注意，光阻下的氧层受到保护。

And new problems arise: today, PFAS-based photoresists are essential to make ever-smaller features.

新的问题出现了：如今，基于PFAS的光刻胶对于制造越来越小的特征至关重要。

Next, photoresist is spread across the surface and the wafer is sent through a soft bake to remove the solvent.

接下来，在表面涂上光阻剂，然后将硅片送入低温烘焙以去除溶剂。

These tools include the photoresist spin coater, photolithography tool, developer, and photoresist stripper.

这些工具包括光阻旋涂机、光刻设备、显影剂和光阻剥离剂。

To clean up, we use yet another special chemical that washes away any remaining photoresist.

为了清理，我们使用另一种特殊的学物质来洗掉任何剩余的光阻剂。

Wherever the light from the stencil touches the wafer, the photoresist is weakened.

无论模板上的光线照射到硅片的哪个位置，光阻都会被削弱。

Once again, we wash away remaining photoresist.

再次，我们清除剩余的光刻胶。