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Sometimes engineers will use chemicals to clean up of the master on the photoresist or chemical substance, such as hydrogen peroxide, acetonic.

有时会拔取一些化学品去纯不母盘上的平刻或化学精氧水,丙酮。

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Then, a liquid called " photoresist" is spun on and baked to harden.

接着,一种名为“光刻胶液体被均匀涂抹并烘烤硬化。

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In the lit areas, a reaction weakens the photoresist's chemical bonds.

在光照区域,反应会削弱光刻胶化学键。

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Next, using UV light and a stencil, a pattern is applied to the photoresist.

接下来,使用紫外线和模板,在光阻剂上施加图案。

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The wafer is then sent through a hard bake to harden the remaining photoresist.

然后将硅片送烘烤工,以硬化刻胶。

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Where the mask blocks the light, the photoresist is unchanged.

在掩模阻挡光线地方,光阻剂不会发生变化。

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Photoresists aren’t very useful by themselves, but are super powerful when used in conjunction with a photomask.

光阻剂自身并不是非常有用,但与光掩模结合使用时就变得非常强大。

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Next, the wafer is sent to a photoresist stripper, where the mask layer is removed.

接下来,晶圆会被送到光阻剥离机,其中掩模层会被去除。

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The wafer is doused in another chemical to wash away that weakened photoresist, leaving an image of the mask.

晶圆会被另一种化学物质冲洗, 以清除那层被削弱阻剂,留下掩模图像。

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Note that the oxide layer under the photoresist is protected.

请注意,光阻下氧化层受到保护。

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And new problems arise: today, PFAS-based photoresists are essential to make ever-smaller features.

问题出现了:如今,基于PFAS光刻胶对于制造越来越小特征至关重要。

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Next, photoresist is spread across the surface and the wafer is sent through a soft bake to remove the solvent.

接下来,在表面涂上阻剂,然后将硅片送烘焙以去除溶剂。

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These tools include the photoresist spin coater, photolithography tool, developer, and photoresist stripper.

这些工具包括光阻旋涂机、光刻设备、显影剂和光阻剥离剂。

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To clean up, we use yet another special chemical that washes away any remaining photoresist.

为了清理,我们使用另一种特殊化学物质来洗掉任何阻剂。

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Wherever the light from the stencil touches the wafer, the photoresist is weakened.

无论模板上光线照射到硅片哪个位置,光阻都会被削弱。

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Once again, we wash away remaining photoresist.

再次,我们清除光刻胶。

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