Then, a liquid called " photoresist" is spun on and baked to harden.

接着，一种名为“光刻胶”液体被均匀涂抹并烘烤硬化。

In the lit areas, a reaction weakens the photoresist's chemical bonds.

在光照区域，反应会削弱光刻胶化学键。

Next, using UV light and a stencil, a pattern is applied to the photoresist.

接下来，使用紫外线和模板，在光阻剂上施加图案。

The wafer is then sent through a hard bake to harden the remaining photoresist.

然后将硅片送烘烤工，以硬化光刻胶。

Where the mask blocks the light, the photoresist is unchanged.

在掩模阻挡光线地方，光阻剂不会发生变化。

Photoresists aren’t very useful by themselves, but are super powerful when used in conjunction with a photomask.

光阻剂自身并不是非常有用，但与光掩模结合使用时就变得非常强大。

Next, the wafer is sent to a photoresist stripper, where the mask layer is removed.

接下来，晶圆会被送到光阻剥离机，其中掩模层会被去除。

The wafer is doused in another chemical to wash away that weakened photoresist, leaving an image of the mask.

晶圆会被另一种化学物质冲洗， 以清除那层被削弱光阻剂，留下掩模图像。

Note that the oxide layer under the photoresist is protected.

请注意，光阻下氧化层受到保护。

And new problems arise: today, PFAS-based photoresists are essential to make ever-smaller features.

新问题出现了：如今，基于PFAS光刻胶对于制造越来越小特征至关重要。

Next, photoresist is spread across the surface and the wafer is sent through a soft bake to remove the solvent.

接下来，在表面涂上光阻剂，然后将硅片送低烘焙以去除溶剂。

These tools include the photoresist spin coater, photolithography tool, developer, and photoresist stripper.

这些工具包括光阻旋涂机、光刻设备、显影剂和光阻剥离剂。

To clean up, we use yet another special chemical that washes away any remaining photoresist.

为了清理，我们使用另一种特殊化学物质来洗掉任何光阻剂。

Wherever the light from the stencil touches the wafer, the photoresist is weakened.

无论模板上光线照射到硅片哪个位置，光阻都会被削弱。

Once again, we wash away remaining photoresist.

再次，我们清除光刻胶。