diselenide

A specific thin-film technology is based on the use of Copper Indium Diselenide (CIS) material.

还有一种基于使用铜铟硒化合物（CIS)材料薄膜技术。

A 77.5% of reduction in deposit formation could be obtained when the multiplex additive of tetralin/ tetralone binary donor and diphenyl diselenide was added into n-dodecane.

复合添加剂比单一试剂效果更明显，二供氢剂与二苯二硒复合添加剂可减少77.5%裂解。