Thewater vapor oxidation is take the high pure water steam as theoxidizing atmosphere, responds the production silicon dioxide by thesilicon chip surface silicon atom and the hydrone.
水
是以高纯水蒸为气氛，由硅片表面的硅原子和水
子反
生
二硅。
Thewater vapor oxidation is take the high pure water steam as theoxidizing atmosphere, responds the production silicon dioxide by thesilicon chip surface silicon atom and the hydrone.
水是以高纯水蒸为气氛，由硅片表面的硅原子和水子反生二硅。
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