Thewater vapor oxidation is take the high pure water steam as theoxidizing atmosphere, responds the production silicon dioxide by thesilicon chip surface silicon atom and the hydrone.
汽
化是以高纯蒸汽为化气氛，由硅片表面的硅原
和
反
生
化硅。
Thewater vapor oxidation is take the high pure water steam as theoxidizing atmosphere, responds the production silicon dioxide by thesilicon chip surface silicon atom and the hydrone.
汽化是以高纯蒸汽为化气氛，由硅片表面的硅原和反生化硅。
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