Thewater vapor oxidation is take the high pure water steam as theoxidizing atmosphere, responds the production silicon dioxide by thesilicon chip surface silicon atom and the hydrone.
水汽
是以高纯水蒸汽为
氛，
硅片表面的硅原子和水分子反
生成二硅。
Thewater vapor oxidation is take the high pure water steam as theoxidizing atmosphere, responds the production silicon dioxide by thesilicon chip surface silicon atom and the hydrone.
水汽是以高纯水蒸汽为氛，硅片表面的硅原子和水分子反生成二硅。
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