Because the distribution of molecular director was not affected by lamellar decorating after quench, chemical etching and SEM technique were used to reveal disclination and director patterns.
由于样品淬火后晶片装饰在织构
而不影响分子
的分布,因而可
用化学刻蚀和电
技术揭示其错和图。
Because the distribution of molecular director was not affected by lamellar decorating after quench, chemical etching and SEM technique were used to reveal disclination and director patterns.
由于样品淬火后晶片装饰在织构而不影响分子的分布,因而可用化学刻蚀和电技术揭示其错和图。
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