A new fabrication method for hollow microneedle array is proposed with three times exposures in deep X-ray lithography of synchrotron radiation and the development procedure.
摘要提出了一种
心微针阵列加工方法，利用三次同步辐射曝光和显影过程来加工微针。
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画;
曝光；电子蚀刻A new fabrication method for hollow microneedle array is proposed with three times exposures in deep X-ray lithography of synchrotron radiation and the development procedure.
摘要提出了一种心微针阵列加工方法，利用三次同步辐射曝光和显影过程来加工微针。
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